N2-H2 capacitively coupled radio-frequency discharges at low pressure. Part II. Modelling results: the relevance of plasma-surface interaction. uri icon

autores

  • Luis Marques
  • Marques, L.
  • Miguel Jiménez-Redondo
  • Audrey Chatain
  • Olivier Guaitella
  • Guy Cernogora
  • Nathalie Carrasco
  • Luis L. Alves
  • Luis S. A. Marques

data de publicação

  • junho 2020