Amorphous and microcrystalline silicon films grown at low temperatures by radio-frequency and hot-wire chemical vapor deposition uri icon

autores

  • Alpuim, P.
  • Alpuim, P.
  • Chu, Virginia
  • Conde, João Pedro
  • Chu, V.
  • Conde, J.P.

data de publicação

  • janeiro 1, 1999