Doping of amorphous and microcrystalline silicon films by hot-wire CVD and RFPECVD at low substrate temperatures on plastic substrates Artigo Académico uri icon

autores

  • Alpuim, P.
  • Alpuim, P.
  • Chu, V.
  • Conde, J.P.

data de publicação

  • janeiro 1, 2000