Atmospheric Pressure Plasma Deposition of Organosilicon Thin Films by Direct Current and Radio-frequency Plasma Jets uri icon

autores

  • Zille, Andrea
  • Kuchakova, Iryna
  • Ionita, Maria Daniela
  • Ionita, Eusebiu-Rosini
  • Leys, C.
  • Lazea-Stoyanova, Andrada
  • Brajnicov, Simona
  • Aksoy-Aksel, A.
  • Bogdana Mitu
  • De Vrieze, Mike

data de publicação

  • março 2020