Influence of sputtering power and the substrate-target distance on the properties of ZrO2 films prepared by RF reactive sputtering Artigo Académico uri icon

autores

  • Martin Andritschky
  • Teixeira, Vasco M. P.
  • Gao, P.
  • Meng, L.J.
  • Dos Santos, M.P.
  • Teixeira, V.
  • Andritschky, M.

data de publicação

  • janeiro 1, 2000