resumo One of the authors (S.M.) acknowledges Direction des Relations Extérieures of Ecole Polytechnique for financial support.
autores Alpuim, P. Cerqueira, María de Fátima Alpuim, P. Geffroy, B. Bonnassieux, Y. Majee, S. Bourée, J. E. Cerqueira, M.F. Alpuim, P. Tondelier, D. Geffroy, B. Majee, S. Bonnassieux, Y. Cerqueira, M. F. Bourée, J.E. Tondelier, D.
palavras-chave Ar plasma treatment Hot-wire CVD Low-temperature deposition Permeation barrier Polymer substrate Silicon nitride
Digital Object Identifier (DOI) https://doi.org/10.1016/j.tsf.2015.09.048 https://doi.org/10.1016/j.tsf.2015.09.048