N2-H2 capacitively coupled radio-frequency discharges at low pressure. Part II. Modelling results: The relevance of plasma-surface interaction uri icon

autores

  • Luis Marques
  • Jiménez-Redondo, M.
  • Chatain, A.
  • Guaitella, O.
  • Cernogora, G.
  • Carrasco, N.
  • Alves, L.L.
  • Marques, L.

data de publicação

  • janeiro 1, 2021