Reactive sputtering of TiOxNy coatings by the reactive gas pulsing process. Part I: Pattern and period of pulses Artigo Académico uri icon

autores

  • Filipe Vaz
  • L Rebouta
  • Martin, N
  • Lintymer, J
  • Gavoille, J
  • Chappe, JM
  • Sthal, F
  • Takadoum, J
  • Vaz, F
  • Rebouta, L

data de publicação

  • janeiro 1, 2007