Phosphorous and boron doping of nc-Si:H thin films deposited on plastic substrates at 150 °C by Hot-Wire Chemical Vapor Deposition Artigo Académico uri icon

autores

  • Alpuim, P.
  • Rolo, Anabela G.
  • Filonovich, S.A.
  • Ribeiro, M.
  • Rolo, A.G.
  • Alpuim, P.

data de publicação

  • janeiro 1, 2008