Properties changes of Ti(C, O, N) films prepared by PVD: The effect of reactive gases partial pressure Artigo Académico uri icon

autores

  • Filipe Vaz
  • Cunha, L.
  • Cunha, L.
  • Moura, C.
  • Moura, C.
  • Vaz, F.
  • Vaz, F.
  • Chappe, J. -M.
  • Chappé, J.-M.
  • Olteanu, C.
  • Olteanu, C.
  • Munteanu, D.
  • Munteanu, D.
  • Munteanu, A.
  • Munteanu, A.

data de publicação

  • janeiro 1, 2009