Amorphous and microcrystalline silicon deposited by hot-wire chemical vapor deposition at low substrate temperatures: Application to devices and thin-film microelectromechanical systems Artigo Académico uri icon

autores

  • Alpuim, P.
  • Conde, J.P.
  • Alpuim, P.
  • Boucinha, M.
  • Gaspar, J.
  • Chu, V.

data de publicação

  • janeiro 1, 2001