publicações selecionadas
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artigo académico
- Plasma-enhanced atomic layer deposition of silicon nitride using bis(diethylamino)silane precursor with N2-plasma. Materials Science in Semiconductor Processing. 2026
- Silicon dioxide atomic layer deposition at low temperature for PDMS microlenses coating. Optical Materials. 2024
- Al2O3 Ultra-Thin Films Deposited by PEALD for Rubidium Optically Pumped Atomic Magnetometers with On-Chip Photodiode. Coatings. 2023
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documento
- Silicon Nitride ultra-thin films by Plasma-Enhanced ALD using BDEAS as precursor with N2-plasma 2025
- PEALD of SiNx using bis(diethylamino)silane (BDEAS) precursor with N2 plasma 2025
- CMEMS-UMinho MNFabs - Advanced Laboratory of micro and nanofabrication for semiconductors 2025
- Quantum Optics Activities at MNFabLab-CMEMS-UMinho 2025
- Deposição por camadas atómicas (ALD) Princípios, vantagens, e aplicações 2024
- Atomic Layer Deposition (ALD) Principles, benefits, and applications 2024
- PDMS microlenses coating with a SiO2 ultra-thin film deposited by atomic layer deposition 2024
- Al2O3 ultra-thin films deposited by PEALD and ThALD for rubidium Optically Pumped Atomic Magnetometers 2023
- Characterization of Al2O3 and SiO2 ultra thin-films deposited by ALD for microfabricated rubidium vapor cells 2022
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teses